Name
Nitrogen Trifluoride (NF3)
CAS nr.
7783-54-2
Measuring ranges
Standard range: 0 - 30 ppm
TLV level (TLV-TWA)
10 ppm
Relative density (compared to air):
2.45
Applications
- Nitrogen trifluoride is used in the plasma etching of silicon wafers
- Cleaning of the PECVD chambers in the production of LCD's (liquid-crystal displays) and silicon-based thin-film solar cells
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